Invention Grant
- Patent Title: Radiation-sensitive resin composition, polymer and compound
- Patent Title (中): 辐射敏感性树脂组合物,聚合物和化合物
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Application No.: US13853254Application Date: 2013-03-29
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Publication No.: US09459532B2Publication Date: 2016-10-04
- Inventor: Norihiko Ikeda , Shin-ichi Nakamura
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-220482 20100930; JP2010-227871 20101007; JP2011-007348 20110117; JPPCT/JP2011/071400 20110920
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F224/00 ; G03F7/039 ; C09D133/04 ; C08F220/18 ; G03F7/20

Abstract:
A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.
Public/Granted literature
- US20130216951A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND Public/Granted day:2013-08-22
Information query
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