Invention Grant
- Patent Title: Meander line resistor structure
- Patent Title (中): 曲折线电阻结构
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Application No.: US14880965Application Date: 2015-10-12
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Publication No.: US09461048B2Publication Date: 2016-10-04
- Inventor: Hsiao-Tsung Yen , Yu-Ling Lin
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L23/522 ; H01L23/528 ; H01L27/06 ; H01L29/06 ; H01L49/02 ; H01L21/8234 ; H01L27/08

Abstract:
A system comprises a first transistor comprising a first drain/source region and a second drain/source region, a second transistor comprising a third drain/source region and a fourth drain/source region, wherein the first transistor and the second transistor are separated by an isolation region, a first resistor formed by at least two vias, wherein a bottom via of the first resistor is in direct contact with the first drain/source region, a second resistor formed by at least two vias, wherein a bottom via of the second resistor is in direct contact with the second drain/source region, a bit line connected to the third drain/source region through a plurality of bit line contacts and a capacitor connected to the fourth drain/source region through a capacitor contact.
Public/Granted literature
- US20160035729A1 Meander Line Resistor Structure Public/Granted day:2016-02-04
Information query
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