Invention Grant
- Patent Title: Method of heating, method of producing piezoelectric film, and light irradiation device
- Patent Title (中): 加热方法，制造压电膜的方法和光照射装置
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Application No.: US14160701Application Date: 2014-01-22
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Publication No.: US09461239B2Publication Date: 2016-10-04
- Inventor: Xianfeng Chen
- Applicant: Xianfeng Chen
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: JP2013-020389 20130205
- Main IPC: H01L41/314
- IPC: H01L41/314 ; H01L41/318 ; H01L41/331 ; H01L41/09 ; H01L41/187
Abstract:
A method of heating includes a process of forming a layer to be heated on one surface of a light absorption layer; and a process of heating the light absorption layer by irradiating light onto the other surface of the light absorption layer. The other surface of the light absorption layer is a surface opposite to the one surface of the light absorption layer.
Public/Granted literature
- US20140216643A1 METHOD OF HEATING, METHOD OF PRODUCING PIEZOELECTRIC FILM, AND LIGHT IRRADIATION DEVICE Public/Granted day:2014-08-07
Information query
IPC分类:
