Invention Grant
US09461637B2 Method and apparatus for controlling a gate voltage in high electron mobility transistor
有权
用于控制高电子迁移率晶体管中的栅极电压的方法和装置
- Patent Title: Method and apparatus for controlling a gate voltage in high electron mobility transistor
- Patent Title (中): 用于控制高电子迁移率晶体管中的栅极电压的方法和装置
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Application No.: US14106991Application Date: 2013-12-16
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Publication No.: US09461637B2Publication Date: 2016-10-04
- Inventor: Sun-kyu Hwang , Woo-chul Jeon , Joon-yong Kim , Ki-yeol Park , Young-hwan Park , Jai-kwang Shin , Jae-joon Oh , Jong-bong Ha
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2013-0020675 20130226
- Main IPC: H03K17/06
- IPC: H03K17/06 ; H01L29/778 ; H01L29/20 ; G01N27/02 ; G01N27/08

Abstract:
According to example embodiments, a method for controlling a gate voltage applied to a gate electrode of a high electron mobility transistor (HEMT) may include measuring a voltage between a drain electrode and a source electrode of the HEMT, and adjusting a level of the gate voltage applied to the gate electrode of the HEMT according to the measured voltage. The level of the gate electrode may be adjusted if the voltage between the drain electrode and the source electrode is different than a set value.
Public/Granted literature
- US20140240026A1 METHOD AND APPARATUS FOR CONTROLLING A GATE VOLTAGE IN HIGH ELECTRON MOBILITY TRANSISTOR Public/Granted day:2014-08-28
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