Invention Grant
- Patent Title: Multi-layer micro-wire substrate method
- Patent Title (中): 多层微丝衬底法
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Application No.: US14023757Application Date: 2013-09-11
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Publication No.: US09465501B2Publication Date: 2016-10-11
- Inventor: Ronald Steven Cok
- Applicant: Ronald Steven Cok
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent Raymond L. Owens; William R. Zimmerli
- Main IPC: H05K3/40
- IPC: H05K3/40 ; H05K3/46 ; G06F3/047 ; G06F3/044 ; H05K1/02 ; H05K1/11 ; H05K1/09

Abstract:
A method of making a multi-layer micro-wire structure includes providing a substrate having a substrate edge and first and second layers formed over the substrate. One or more micro-channels are imprinted in each of the first and second layers and first and second micro-wires located in the imprinted micro-channels, the micro-wires forming at least a portion of an exposed connection pad in each layer. The second layer edge is farther from the substrate edge than the first layer edge for at least a portion of the second layer edge so that the first connection pads are exposed through the second layer.
Public/Granted literature
- US20150068032A1 MULTI-LAYER MICRO-WIRE SUBSTRATE METHOD Public/Granted day:2015-03-12
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