Invention Grant
- Patent Title: Nonvolatile semiconductor storage device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US14197628Application Date: 2014-03-05
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Publication No.: US09466373B2Publication Date: 2016-10-11
- Inventor: Nobuaki Okada , Masayuki Akou , Mitsuhiro Noguchi
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G11C16/08
- IPC: G11C16/08 ; G11C16/10 ; G11C7/14 ; G11C8/08 ; G11C11/56 ; G11C16/04 ; H01L27/115

Abstract:
According to one embodiment, a nonvolatile semiconductor storage device includes a word line transfer unit which transfers voltage applied to a memory cell selected on the basis of an address to a word line. The word line transfer unit includes a word line transfer transistor which is arranged in a first layout area of the word line transfer unit and transfers voltage applied to the memory cell to the word line and a dummy word line transfer transistor which is arranged in a second layout area provided outside an end of the first layout area and does not transfer voltage applied to the memory cell to the word line.
Public/Granted literature
- US20150187428A1 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2015-07-02
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