Invention Grant
US09466468B2 Shower head, plasma processing apparatus and plasma processing method
有权
淋浴头,等离子体处理装置和等离子体处理方法
- Patent Title: Shower head, plasma processing apparatus and plasma processing method
- Patent Title (中): 淋浴头,等离子体处理装置和等离子体处理方法
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Application No.: US14224109Application Date: 2014-03-25
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Publication No.: US09466468B2Publication Date: 2016-10-11
- Inventor: Nobuyuki Okayama , Koichi Kazama , Shuichiro Uda , Satoshi Yamada , Shinji Fuchigami
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2013-064289 20130326
- Main IPC: H01J37/22
- IPC: H01J37/22 ; C23C16/455 ; H01J37/32

Abstract:
A shower head includes a gas injection plate and a gas supply unit. The gas supply unit has a first gas supply path provided in a region along the axis and a second gas supply path provided in a region surrounding the region where the first gas supply path is provided. The first gas supply path has a first gas diffusion space connected to a first gas line of the gas supply unit, second gas lines, a second gas diffusion space, third gas lines and a third gas diffusion space which are connected in that order. The second gas supply path has a fourth gas diffusion space connected to a fourth gas line of the gas supply unit, fifth gas lines, a fifth gas diffusion space, sixth gas lines, and a sixth gas diffusion space which are connected in that order.
Public/Granted literature
- US20140291286A1 SHOWER HEAD, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD Public/Granted day:2014-10-02
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