Invention Grant
- Patent Title: Semiconductor device including two thin film transistors and method of manufacturing the same
- Patent Title (中): 包括两个薄膜晶体管的半导体器件及其制造方法
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Application No.: US13468580Application Date: 2012-05-10
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Publication No.: US09466618B2Publication Date: 2016-10-11
- Inventor: Hiroyuki Miyake
- Applicant: Hiroyuki Miyake
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP2011-108844 20110513
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/786 ; H01L29/417 ; H01L27/11

Abstract:
It is an object to form a buffer circuit, an inverter circuit, or the like using only n-channel TFTs including an oxide semiconductor layer. A buffer circuit, an inverter circuit, or the like is formed by combination of a first transistor in which a source electrode and a drain electrode each overlap with a gate electrode and a second transistor in which a source electrode overlaps with a gate electrode and a drain electrode does not overlap with the gate electrode. Since the second transistor has such a structure, the capacitance Cp can be small, and VA′ can be large even in the case where the potential difference VDD−VSS is small.
Public/Granted literature
- US20120286263A1 Semiconductor Device and Method of Manufacturing the Same Public/Granted day:2012-11-15
Information query
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