Invention Grant
- Patent Title: Junction barrier schottky diode and method for manufacturing the same
- Patent Title (中): 结型势垒肖特基二极管及其制造方法
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Application No.: US14731105Application Date: 2015-06-04
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Publication No.: US09466735B2Publication Date: 2016-10-11
- Inventor: Tomoaki Tanaka
- Applicant: Synaptics Display Devices GK
- Applicant Address: JP Tokyo
- Assignee: Synaptics Display Devices GK
- Current Assignee: Synaptics Display Devices GK
- Current Assignee Address: JP Tokyo
- Agency: Patterson + Sheridan, LLP
- Priority: JP2014-130346 20140625
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/06

Abstract:
A junction barrier Schottky diode is formed by shifting second semiconductor regions of a second conductivity type in a staggered shape in a first semiconductor region of a first conductivity type so that pn junction regions are formed at predetermined distances between the second semiconductor regions and the first semiconductor region. A third semiconductor region of the first conductivity type is formed between the second semiconductor regions in order to form a Schottky junction region. An electrode is formed on the second and third semiconductor regions. The second semiconductor regions arranged at equal distances in an X direction are formed in a plurality of columns in a Y direction. An amount of shift between adjacent columns in the X direction is set such that a Y-direct ion distance between the second semiconductor regions in the different columns is larger than an X-direction distance between the second semiconductor regions in each column.
Public/Granted literature
- US20150380570A1 JUNCTION BARRIER SCHOTTKY DIODE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2015-12-31
Information query
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