Invention Grant
- Patent Title: Coil substrate, method of manufacturing the same, and inductor
- Patent Title (中): 线圈基板,其制造方法和电感器
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Application No.: US14341868Application Date: 2014-07-28
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Publication No.: US09472332B2Publication Date: 2016-10-18
- Inventor: Atsushi Nakamura , Kiyokazu Sato
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP Nagano-shi, Nagano
- Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee Address: JP Nagano-shi, Nagano
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2013-159572 20130731
- Main IPC: H01F5/00
- IPC: H01F5/00 ; H01F17/00

Abstract:
A coil substrate includes a plurality of structural bodies, each of which comprises a first insulating layer, a wiring formed on the first insulating layer and configured to serve as a part of a spiral coil, and a second insulating layer formed on the first insulating layer and configured to cover the wiring. The plurality of structural bodies are stacked via an adhesion layer. The spiral coil is formed by series-connecting the wirings of adjacent ones of the plurality of structural bodies.
Public/Granted literature
- US20150035639A1 COIL SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND INDUCTOR Public/Granted day:2015-02-05
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