Invention Grant
- Patent Title: Methods to fabricate a radio frequency integrated circuit
- Patent Title (中): 制造射频集成电路的方法
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Application No.: US14525632Application Date: 2014-10-28
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Publication No.: US09472514B2Publication Date: 2016-10-18
- Inventor: Weimin Sun , Peter J. Zampardi, Jr. , Hongxiao Shao
- Applicant: Skyworks Solutions, Inc.
- Applicant Address: US MA Woburn
- Assignee: Skyworks Solutions, Inc.
- Current Assignee: Skyworks Solutions, Inc.
- Current Assignee Address: US MA Woburn
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: H05K3/02
- IPC: H05K3/02 ; H05K3/10 ; H01L23/00 ; C25D5/02 ; C25D5/12 ; H05K3/34 ; C25D7/06 ; C25D17/00 ; H05K1/02 ; H05K3/24

Abstract:
To reduce radio frequency (RF) losses during operation of a radio frequency integrated circuit (RFIC) module, the RFIC module is fabricated such that at least one of an edge of the wirebond pad on the copper trace and a sidewall of the copper trace is free from high-resistivity plating material. The unplated portion provides a path for the RF current to flow around the high-resistivity material, which reduces the RF signal loss associated with the high resistivity plating material.
Public/Granted literature
- US20150044863A1 SYSTEMS AND METHODS TO FABRICATE A RADIO FREQUENCY INTEGRATED CIRCUIT Public/Granted day:2015-02-12
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