Invention Grant
- Patent Title: Operational Gallium Nitride devices
- Patent Title (中): 操作氮化镓器件
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Application No.: US14216026Application Date: 2014-03-17
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Publication No.: US09472625B2Publication Date: 2016-10-18
- Inventor: Gerald Deboy
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Shumaker & Sieffert, P.A.
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L29/20 ; H01L27/06 ; H01L29/205 ; H01L29/423 ; H01L29/778 ; H01L29/872 ; H01L29/417 ; H02M1/00 ; H01L21/8258

Abstract:
A power circuit is described that includes a semiconductor body having a common substrate and a Gallium Nitride (GaN) based substrate. The GaN based substrate includes one or more GaN devices adjacent to a front side of the common substrate. The common substrate is electrically coupled to a node of the power circuit. The node of the power circuit is at a particular potential that is equal to, or more negative than, a potential at one or more load terminals of the one or more GaN devices.
Public/Granted literature
- US20150263100A1 OPERATIONAL GALLIUM NITRIDE DEVICES Public/Granted day:2015-09-17
Information query
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