Invention Grant
US09472639B2 Forming a liquid ejection head with through holes and a depression 有权
形成具有通孔和凹陷的液体喷射头

Forming a liquid ejection head with through holes and a depression
Abstract:
A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes.
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