Invention Grant
- Patent Title: Forming a liquid ejection head with through holes and a depression
- Patent Title (中): 形成具有通孔和凹陷的液体喷射头
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Application No.: US13945617Application Date: 2013-07-18
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Publication No.: US09472639B2Publication Date: 2016-10-18
- Inventor: Hiroyuki Shimoyama , Taichi Yonemoto , Shuji Koyama , Masaki Ohsumi , Keiji Matsumoto , Seiichiro Yaginuma
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A. Inc., IP Division
- Priority: JP2012-161640 20120720
- Main IPC: H01L29/66
- IPC: H01L29/66 ; B41J2/16

Abstract:
A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes.
Public/Granted literature
- US20140024148A1 METHOD OF MANUFACTURING SUBSTRATE OF LIQUID EJECTION HEAD Public/Granted day:2014-01-23
Information query
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