Invention Grant
- Patent Title: Fabrication apparatus for fabricating a patterned layer
- Patent Title (中): 用于制造图案层的制造装置
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Application No.: US14117436Application Date: 2012-05-09
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Publication No.: US09472787B2Publication Date: 2016-10-18
- Inventor: Christoph Rickers , Pieter Gijsbertus Maria Kruijt
- Applicant: Christoph Rickers , Pieter Gijsbertus Maria Kruijt
- Applicant Address: DE Aachen
- Assignee: OLEDWorks GmbH
- Current Assignee: OLEDWorks GmbH
- Current Assignee Address: DE Aachen
- Agent Stephen P. Singer
- Priority: EP11167070 20110523
- International Application: PCT/IB2012/052292 WO 20120509
- International Announcement: WO2012/160468 WO 20121129
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L51/56 ; H01L51/00 ; H01L51/50

Abstract:
The invention relates to a fabrication apparatus for fabricating a patterned layer (18) on a substrate (14). Protective material (17) is applied in second regions on the substrate (14) and liquid layer material (18) is then printed in first regions being different to the second regions on the substrate (14). The layer material (18) is dried by heating the layer material (18) to a drying temperature being smaller than a melting temperature of the protective material (17), before removing the protective material (17) from the substrate (14) by using a removing temperature being larger than the melting temperature of the protective material (17). A patterned layer (18) can therefore be produced, without using, for example, a costly photolithography process, and because of the use of the protective material (17) the layer material (18) is present in the desired first regions only and not in the second regions. This improves the quality of the patterned layer, which may be used for producing an OLED.
Public/Granted literature
- US20140203250A1 FABRICATION APPARATUS FOR FABRICATING A PATTERNED LAYER Public/Granted day:2014-07-24
Information query
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