Invention Grant
- Patent Title: Methods and apparatus of packaging semiconductor devices
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Application No.: US14724707Application Date: 2015-05-28
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Publication No.: US09478511B2Publication Date: 2016-10-25
- Inventor: Chun-Lin Lu , Hsien-Wei Chen , Kai-Chiang Wu , Hung-Jui Kuo
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/31 ; H01L23/525 ; H01L23/532

Abstract:
Methods and apparatus are disclosed which reduce the stress concentration at the redistribution layers (RDLs) of a package device. A package device may comprise a seed layer above a passivation layer, covering an opening of the passivation layer, and covering and in contact with a contact pad. A RDL is formed above the passivation layer, above and in contact with the seed layer, covering the opening of the passivation layer, and electrically connected to the contact pad through the seed layer. The RDL has an end portion with a surface that is smooth without a right angle. The surface of the end portion of the RDL may have an obtuse angle, or a curved surface.
Public/Granted literature
- US20150262948A1 Methods and Apparatus of Packaging Semiconductor Devices Public/Granted day:2015-09-17
Information query
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