Invention Grant
US09478733B2 Co/Ni multilayers with improved out-of-plane anisotropy for magnetic device applications
有权
Co / Ni多层膜,具有改进的磁性器件应用的面外各向异性
- Patent Title: Co/Ni multilayers with improved out-of-plane anisotropy for magnetic device applications
- Patent Title (中): Co / Ni多层膜,具有改进的磁性器件应用的面外各向异性
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Application No.: US14529248Application Date: 2014-10-31
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Publication No.: US09478733B2Publication Date: 2016-10-25
- Inventor: Guenole Jan , Witold Kula , Ru Ying Tong , Yu Jen Wang
- Applicant: Headway Technologies, Inc.
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L43/10 ; G01R33/09 ; G01R33/12 ; H01L43/08 ; H01L43/12 ; G11B5/127 ; G11C11/16 ; G11B5/39

Abstract:
A MTJ for a spintronic device includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/Ni)n composition or the like where n is from 2 to 30. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof with a thickness from 10 to 100 Angstroms. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to serve as a transitional layer between a (111) laminate and (100) MgO tunnel barrier. There may be a Ta insertion layer between the CoFeB layer and laminated layer to promote (100) crystallization in the CoFeB layer. The laminated layer may be used as a free layer in a MTJ. Annealing between 300° C. and 400° C. may be used to further enhance PMA in the laminated layer.
Public/Granted literature
- US20150061056A1 Co/Ni Multilayers with Improved Out-of-Plane Anisotropy for Magnetic Device Applications Public/Granted day:2015-03-05
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