Invention Grant
- Patent Title: Imprint method
- Patent Title (中): 印记法
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Application No.: US14620793Application Date: 2015-02-12
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Publication No.: US09481114B2Publication Date: 2016-11-01
- Inventor: Tsutomu Hashimoto
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Main IPC: B29C39/44
- IPC: B29C39/44 ; G03F7/00 ; B82Y10/00 ; B82Y40/00 ; B29C39/00 ; B29C59/02

Abstract:
An imprint method using a mold includes the steps of applying on a substrate a resin composed of a mixture of an ultraviolet curable resin cured with ultraviolet light and a luminescent material that undergoes fluorescence or phosphorescence upon receiving ultraviolet light, imprinting the mold into the resin applied to the substrate, curing the resin applied to the substrate using ultraviolet light, releasing the mold from the substrate imprinted with the pattern, and detecting light from any residual resin remaining on the mold. The imprint method can use an imprint apparatus that includes a light-emission detecting unit configured to detect light emitted from the luminescent material. After the mold is released from the resin on the substrate, the detecting step can use the light-emission detecting unit to detect light emitted from any residual resin remaining in a concave and convex portion of the pattern formed on the mold.
Public/Granted literature
- US20150151462A1 IMPRINT METHOD Public/Granted day:2015-06-04
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