Invention Grant
US09482834B2 Semiconductor optical device and method for producing semiconductor optical device
有权
半导体光学器件及半导体光学器件的制造方法
- Patent Title: Semiconductor optical device and method for producing semiconductor optical device
- Patent Title (中): 半导体光学器件及半导体光学器件的制造方法
-
Application No.: US14627885Application Date: 2015-02-20
-
Publication No.: US09482834B2Publication Date: 2016-11-01
- Inventor: Takehiko Kikuchi , Hideki Yagi , Yoshihiro Yoneda
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP.
- Priority: JP2014-036850 20140227
- Main IPC: G02B6/30
- IPC: G02B6/30 ; G02B6/12 ; G02B6/44 ; H01L31/0232 ; H01L21/00 ; G02B6/42 ; H01L31/0352 ; H01L31/105 ; H01L31/18

Abstract:
A semiconductor optical device includes a substrate including first and second regions arranged in a first direction, a photodiode disposed on the first region, an optical waveguide disposed on the second region, and a buried layer disposed on a side surface of the photodiode. The side surface of the photodiode extends in the first direction. The photodiode has a first end surface intersecting with the first direction, and the optical waveguide is in direct contact with the first end surface. The buried layer is composed of a III-V compound semiconductor doped with a transition metal. The photodiode includes a stacked semiconductor layer including a first cladding layer, a light-absorbing layer and a second cladding layer stacked in that order on the substrate. The light-absorbing layer has a side surface having at least a portion recessed with respect to a side surface of the first cladding layer.
Public/Granted literature
- US20150241648A1 SEMICONDUCTOR OPTICAL DEVICE AND METHOD FOR PRODUCING SEMICONDUCTOR OPTICAL DEVICE Public/Granted day:2015-08-27
Information query