Invention Grant
- Patent Title: Curable composition for imprints, pattern-forming method and pattern
- Patent Title (中): 压印组合物，图案形成方法和图案
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Application No.: US14063739Application Date: 2013-10-25
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Publication No.: US09482950B2Publication Date: 2016-11-01
- Inventor: Kunihiko Kodama , Yuichiro Goto
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-099583 20110427; JP2011-184530 20110826
- Main IPC: G03F7/075
- IPC: G03F7/075 ; B82Y10/00 ; B82Y40/00 ; G03F7/00 ; C08F22/40 ; C08F30/08 ; G03F7/027
Abstract:
Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below. Formula (I)
Public/Granted literature
- US20140050900A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERN-FORMING METHOD AND PATTERN Public/Granted day:2014-02-20
Information query
IPC分类:
