Invention Grant
- Patent Title: Method of detecting arc discharge in a plasma process
- Patent Title (中): 在等离子体工艺中检测电弧放电的方法
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Application No.: US13191960Application Date: 2011-07-27
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Publication No.: US09484189B2Publication Date: 2016-11-01
- Inventor: Markus Winterhalter , Peter Wiedemuth
- Applicant: Markus Winterhalter , Peter Wiedemuth
- Applicant Address: DE Freiburg
- Assignee: TRUMPF Huettinger GmbH + Co. KG
- Current Assignee: TRUMPF Huettinger GmbH + Co. KG
- Current Assignee Address: DE Freiburg
- Agency: Fish & Richardson P.C.
- Priority: DE102004015090 20040325
- Main IPC: H01H9/50
- IPC: H01H9/50 ; H01J37/32

Abstract:
An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal.
Public/Granted literature
- US20110279121A1 Method of Detecting Arc Discharge in a Plasma Process Public/Granted day:2011-11-17
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