Invention Grant
- Patent Title: Processing station for planar substrates and method for processing planar substrates
- Patent Title (中): 平面基板用加工台及平面基板的加工方法
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Application No.: US14384295Application Date: 2013-02-25
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Publication No.: US09484234B2Publication Date: 2016-11-01
- Inventor: Michael Reichenbach , Markus Bau
- Applicant: JRT PHOTOVOLTAICS GMBH & CO. KG
- Applicant Address: DE Malterdingen
- Assignee: JRT PHOTOVOLTAICS GMBH & CO. KG
- Current Assignee: JRT PHOTOVOLTAICS GMBH & CO. KG
- Current Assignee Address: DE Malterdingen
- Agency: Flynn, Thiel, Boutell & Tanis, P.C.
- Priority: DE102012205249 20120330
- International Application: PCT/EP2013/053655 WO 20130225
- International Announcement: WO2013/143795 WO 20131003
- Main IPC: B65G37/00
- IPC: B65G37/00 ; H01L21/677

Abstract:
A processing station for two-dimensional substrates including at least two processing units and at least two conveyor lines for substrates arranged in parallel to another, wherein both the processing units are placed between the two conveyor lines, and an arrangement for moving the substrates from the conveyor lines to the processing units and back is provided. The arrangement includes four linear conveyor units each having at least one substrate support, wherein a first linear conveyor unit leads from the second conveyor line to the first processing unit, a second linear conveyor unit leads from the first conveyor line to the first processing unit, a third linear conveyor unit leads from the first conveyor line to the second processing unit, and a fourth linear conveyor unit leads from the second conveyor line to the second processing unit.
Public/Granted literature
- US20150030418A1 PROCESSING STATION FOR TWO-DIMENSIONAL SUBSTRATES AND METHOD FOR PROCESSING TWO-DIMENSIONAL SUBSTRATES Public/Granted day:2015-01-29
Information query
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