Invention Grant
- Patent Title: Processing chamber with features from side wall
- Patent Title (中): 处理室具有侧壁特征
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Application No.: US14255730Application Date: 2014-04-17
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Publication No.: US09484243B2Publication Date: 2016-11-01
- Inventor: Dean J. Larson , Jason Augustino , Andreas Fischer , Andre W. Desepte , Harmeet Singh
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- Main IPC: H01L21/673
- IPC: H01L21/673 ; H01L21/687 ; H01L21/67

Abstract:
A processing chamber having a chamber housing with a top and sidewalls is provided. The processing chamber has a seal for connecting the sidewalls of the chamber housing to a top of a lower chamber below the processing chamber. A substrate holder is attached to the sidewalls of the chamber housing. Further, a wafer lift ring supported by a side arm extending through the sidewalls has at least three posts each having at least one finger, the top of the fingers defining a first wafer handoff plane. The lower chamber has at least one lowest wafer support that defines a second wafer handoff plane where the height between the first wafer handoff plane and the second wafer handoff plane is not greater than a maximum vertical stroke of a transfer arm that is configured to transfer a wafer from the first wafer handoff plane and the second wafer handoff plane.
Public/Granted literature
- US20150303085A1 PROCESSING CHAMBER WITH FEATURES FROM SIDE WALL Public/Granted day:2015-10-22
Information query
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