Invention Grant
- Patent Title: High frequency device
- Patent Title (中): 高频设备
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Application No.: US13961976Application Date: 2013-08-08
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Publication No.: US09484321B2Publication Date: 2016-11-01
- Inventor: Shinichi Miwa , Shohei Imai , Masaharu Hattori , Takaaki Yoshioka
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2012-258889 20121127
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/66 ; H05K1/02

Abstract:
A high frequency device includes a base plate having a main surface, a dielectric on the main surface, along a first side of the base plate, a signal line on the dielectric and extending from the first side toward a central portion of the main surface, an island pattern of a metal on the dielectric, a metal frame having a contact portion contacting the main surface and a bridge portion on the signal line and the island pattern, together enclosing the central portion, a lead frame connected to an outside signal line of the signal line and which is located outside the metal frame, a semiconductor chip secured to the central portion, and a wire connecting the semiconductor chip to an inside signal line of the signal line and which is enclosed within the metal frame.
Public/Granted literature
- US20140146506A1 HIGH FREQUENCY DEVICE Public/Granted day:2014-05-29
Information query
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