Invention Grant
- Patent Title: Array substrate and method for manufacturing the same, display device
- Patent Title (中): 阵列基板及其制造方法,显示装置
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Application No.: US14386209Application Date: 2013-12-03
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Publication No.: US09484364B2Publication Date: 2016-11-01
- Inventor: Jing Li , Wenyu Zhang , Jiaxiang Zhang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN201310282257 20130705
- International Application: PCT/CN2013/088430 WO 20131203
- International Announcement: WO2015/000257 WO 20150108
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/417 ; H01L23/50

Abstract:
An array substrate and a display device are presented. The array substrate includes: a base substrate and a plurality of thin film transistor units located on the base substrate, wherein, the thin film transistor unit includes: a first gate electrode located on the base substrate, a gate insulating layer located on the first gate electrode, a drain electrode disposed in the same layer as the first gate electrode, an active layer located on the drain electrode, a source electrode located on the active layer, a first transparent conductive layer is provided between the base substrate and the first gate electrode and the drain electrode that are disposed in the same layer, and the gate insulating layer is also disposed between the first gate electrode plus the first transparent conductive layer beneath it and the drain electrode plus the first transparent conductive layer beneath it.
Public/Granted literature
- US20160247840A1 ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, DISPLAY DEVICE Public/Granted day:2016-08-25
Information query
IPC分类: