Invention Grant
- Patent Title: Heat treatment method of synthetic quartz glass
- Patent Title (中): 合成石英玻璃的热处理方法
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Application No.: US14621732Application Date: 2015-02-13
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Publication No.: US09487426B2Publication Date: 2016-11-08
- Inventor: Hisashi Yagi , Masaki Takeuchi , Daijitsu Harada
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-031479 20140221
- Main IPC: C03B25/02
- IPC: C03B25/02 ; C03B19/14 ; C03B32/00

Abstract:
A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (ΔOH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060° C. for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of −7° C./hr to −30° C./hr, second heat treatment of holding at 1,030-950° C. for a time of 5-20 hours, and annealing at a rate of −25° C./hr to −85° C./hr. Two stages of heat treatment ensures that the glass has a low birefringence.
Public/Granted literature
- US20150239766A1 HEAT TREATMENT METHOD OF SYNTHETIC QUARTZ GLASS Public/Granted day:2015-08-27
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