Invention Grant
- Patent Title: Mask inspection apparatus and mask inspection method
- Patent Title (中): 面膜检查仪和面膜检查方法
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Application No.: US14606427Application Date: 2015-01-27
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Publication No.: US09495740B2Publication Date: 2016-11-15
- Inventor: Toshiyuki Watanabe
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-017977 20140131
- Main IPC: G06T7/00
- IPC: G06T7/00 ; H04N5/372 ; H04N5/225 ; H04N5/359 ; H04N5/33

Abstract:
A mask inspection apparatus including, a driving unit configured to drive a stage holding an inspection target mask, in which a pattern is formed, or a calibration mask, a light irradiation device configured to irradiate light on the inspection target mask or the calibration mask, an image sensor configured to detect a light quantity signal of transmitted light or reflected light of the inspection target mask or the calibration mask at a plurality of pixels. A sensor amplifier configured to amplify an output of the image sensor with respect to each pixel, generates an optical image, and normalizes a gain and an offset of signal amplitude, wherein at a first setting the sensor amplifier sets the gain and the offset using the calibration mask, and at a second setting the sensor amplifier sets the gain and offset of the inspection target mask based on the first setting.
Public/Granted literature
- US20150221075A1 MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD Public/Granted day:2015-08-06
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