Invention Grant
- Patent Title: Non-volatile memory
- Patent Title (中): 非易失性存储器
-
Application No.: US14842857Application Date: 2015-09-02
-
Publication No.: US09508447B2Publication Date: 2016-11-29
- Inventor: Te-Hsun Hsu
- Applicant: eMemory Technology Inc.
- Applicant Address: TW Hsinchu
- Assignee: eMemory Technology Inc.
- Current Assignee: eMemory Technology Inc.
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: G11C17/18
- IPC: G11C17/18 ; H01L27/115 ; H01L29/78 ; G11C16/14 ; G11C16/04 ; G11C17/16 ; H01L29/10 ; H01L23/525 ; H01L27/108 ; H01L27/11 ; H01L27/112 ; H01L29/06 ; H01L29/861 ; H01L29/868 ; G11C29/00

Abstract:
A non-volatile memory including a substrate, a floating gate transistor, a select transistor and a stress-releasing transistor. The floating gate transistor, the select transistor and the stress-releasing transistor are disposed on the substrate and coupled in series with each other. The stress-releasing transistor is located between the floating gate transistor and the select transistor.
Public/Granted literature
- US20160104711A1 NON-VOLATILE MEMORY Public/Granted day:2016-04-14
Information query