Invention Grant
- Patent Title: Semiconductor memory device and method for manufacturing the same
- Patent Title (中): 半导体存储器件及其制造方法
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Application No.: US14645682Application Date: 2015-03-12
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Publication No.: US09508739B2Publication Date: 2016-11-29
- Inventor: Naoki Yasuda
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L29/792
- IPC: H01L29/792 ; H01L27/115 ; H01L29/51 ; H01L21/28 ; H01L21/02

Abstract:
According to one embodiment, a semiconductor memory device includes a stacked body including a plurality of electrode members and a plurality of insulating members, each of the electrode members and each of the insulating members being stacked alternately in a first direction on the substrate. The semiconductor memory device also includes a memory hole that extends in the stacked body in the first direction and a semiconductor member that is disposed to extend in the memory hole in the first direction. The semiconductor memory device also includes a memory member that is disposed between the semiconductor member and the plurality of electrode members. The plurality of electrode members including a first electrode member and a second electrode member, a thickness of the memory member at the position of the first electrode member being greater than a thickness of the memory member at the position of the second electrode member.
Public/Granted literature
- US20160079263A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-03-17
Information query
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