Invention Grant
- Patent Title: Semiconductor device including a resistor metallic layer and method of forming the same
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Application No.: US14671956Application Date: 2015-03-27
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Publication No.: US09508785B1Publication Date: 2016-11-29
- Inventor: Douglas Dean Lopata , Jeffrey Demski , Jay Norton , Miguel Rojas-Gonzales
- Applicant: Altera Corporation
- Applicant Address: US CA San Jose
- Assignee: Altera Corporation
- Current Assignee: Altera Corporation
- Current Assignee Address: US CA San Jose
- Agency: Fletcher Yoder, P.C.
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L49/02

Abstract:
A semiconductor device including a resistor metallic layer and method forming the same. In one embodiment, the semiconductor device includes a source region and a drain region of a semiconductor switch on a substrate. The semiconductor device also includes the resistor metallic layer over the source region and the drain region of the semiconductor switch. The resistor metallic layer includes a first resistor with a first resistor metallic strip coupled between a first cross member and a second cross member of the resistor metallic layer.
Public/Granted literature
- US09536938B1 Semiconductor device including a resistor metallic layer and method of forming the same Public/Granted day:2017-01-03
Information query
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