Invention Grant
- Patent Title: Three-dimensional nonvolatile memory device, semiconductor system including the same, and method of manufacturing the same
- Patent Title (中): 三维非易失性存储器件,包括其的半导体系统及其制造方法
-
Application No.: US15016425Application Date: 2016-02-05
-
Publication No.: US09520409B2Publication Date: 2016-12-13
- Inventor: Tae Kyung Kim , Dae Sung Eom
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon-Si
- Assignee: SK HYNIX INC.
- Current Assignee: SK HYNIX INC.
- Current Assignee Address: KR Icheon-Si
- Agency: William Park & Associates Ltd.
- Priority: KR10-2014-0062422 20140523
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L27/115 ; G11C16/06 ; H01L21/768

Abstract:
A three-dimensional nonvolatile memory device includes a first vertical channel layer and a second vertical channel layer extending from a substrate, a plurality of memory cells, first selection transistors and second selection transistors spaced apart from each other along the first vertical channel layer and the second vertical channel layer, a pad, a contact plug and a bit line in a stacked configuration over the first vertical channel layer, and a common source line formed over the second vertical channel layer.
Public/Granted literature
Information query
IPC分类: