Invention Grant
- Patent Title: Methods for forming CMOS inverters
- Patent Title (中): CMOS逆变器的形成方法
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Application No.: US15155974Application Date: 2016-05-16
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Publication No.: US09524912B2Publication Date: 2016-12-20
- Inventor: Aimei Lin , Juilin Lu , Yiqi Wang
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
- Applicant Address: CN Shanghai
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee Address: CN Shanghai
- Agency: Anova Law Group, PLLC
- Priority: CN201310713406 20131220
- Main IPC: H01L21/70
- IPC: H01L21/70 ; H01L21/8238 ; H01L27/092

Abstract:
A CMOS inverter is provided. The CMOS inverter includes a substrate. The CMOS inverter also includes an NMOS transistor having a first active region, a first isolation structure surrounding the first active region, a first connect structure, a plurality of the first metal interconnect structure and a first shunted gate structure to reduce a delay time and increase a saturation current. Further, the CMOS inverter includes a PMOS transistor having a second active region with a reduced area to reduce the delay time and increase the saturation current, a second isolation structure surrounding the second active region, a second connect structure, a plurality of metal interconnect structure and a second gate structure connecting with the first gate structure through the first connect structure and/or the second connect structure.
Public/Granted literature
- US20160260640A1 METHODS FOR FORMING CMOS INVERTERS Public/Granted day:2016-09-08
Information query
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