Invention Grant
- Patent Title: Vertical microelectronic component and corresponding production method
- Patent Title (中): 垂直微电子元件及相应的生产方法
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Application No.: US14028610Application Date: 2013-09-17
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Publication No.: US09525056B2Publication Date: 2016-12-20
- Inventor: Christoph Schelling , Walter Daves
- Applicant: Robert Bosch GmbH
- Applicant Address: DE Stuttgart
- Assignee: Robert Bosch GmbH
- Current Assignee: Robert Bosch GmbH
- Current Assignee Address: DE Stuttgart
- Agency: Maginot, Moore & Beck LLP
- Priority: DE102012217073 20120921
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/66 ; H01L29/423 ; H01L29/78 ; H01L29/16 ; H01L29/20

Abstract:
A vertical microelectronic component includes a semiconductor substrate having a front side and a back side, and a multiplicity of fins formed on the front side. Each fin has a side wall and an upper side and is separated from other fins by trenches. Each fin includes a GaN/AlGaN heterolayer region formed on the side wall and including a channel region extending essentially parallel to the side wall. Each fin includes a gate terminal region arranged above the GaN/AlGaN heterolayer region and electrically insulated from the channel region in the associated trench on the side wall. A common source terminal region arranged above the fins is connected to a first end of the channel region in a vicinity of the upper sides. A common drain terminal region arranged above the back side is connected to a second end of the channel region in a vicinity of the front side.
Public/Granted literature
- US20140084299A1 VERTICAL MICROELECTRONIC COMPONENT AND CORRESPONDING PRODUCTION METHOD Public/Granted day:2014-03-27
Information query
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