An apparatus for the plasma coating of a substrate, in particular a press platen, is provided and is used to perform a method to plasma coat the press platen. The apparatus includes a vacuum chamber and, arranged therein, an electrode, which is segmented. Each of the electrode segments has a dedicated connection for an electrical source. Also provided is the method for operating the apparatus. According to the method, a substrate to be coated is positioned opposite the electrode and at least one energy source that is assigned to an electrode segment is activated. Moreover, a gas is introduced, with the effect of bringing about plasma-enhanced chemical vapor deposition on the substrate.