Invention Grant
- Patent Title: High density nonvolatile memory
- Patent Title (中): 高密度非易失性存储器
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Application No.: US14264014Application Date: 2014-04-28
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Publication No.: US09530822B2Publication Date: 2016-12-27
- Inventor: Alexander Mikhailovich Shukh
- Applicant: Alexander Mikhailovich Shukh
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/08 ; G11C11/16 ; H01L43/12

Abstract:
One embodiment of a nonvolatile memory cell comprises a substrate having a surface, a bidirectional current switch comprising a first electrode, a second electrode, and a semiconductor layer disposed between the first and second electrodes, and a magnetoresistive element having a direct contact with the bidirectional current switch and comprising a free ferromagnetic layer having a reversible magnetization direction, a pinned ferromagnetic layer having a fixed magnetization direction, and a tunnel barrier layer disposed between the free and pinned ferromagnetic layers, wherein the magnetization direction of the free ferromagnetic layer is reversed by a bidirectional spin polarized current running through the magnetoresitive element in a direction perpendicular to the substrate surface, and wherein a magnitude of the spin polarized current is controlled by the bidirectional current switch. Other embodiments are described and shown.
Public/Granted literature
- US20140319634A1 High Density Nonvolatile Memory Public/Granted day:2014-10-30
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