Invention Grant
- Patent Title: GaN base light-emitting diode and manufacturing method therefor using mechanical post-processing
- Patent Title (中): GaN基发光二极管及其制造方法采用机械后处理
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Application No.: US14909297Application Date: 2014-07-30
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Publication No.: US09530933B2Publication Date: 2016-12-27
- Inventor: Junhee Choi , Sangwon Kim , Hoyoung Ahn , Eunhong Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2013-0091161 20130731
- International Application: PCT/KR2014/006987 WO 20140730
- International Announcement: WO2015/016602 WO 20150205
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L29/06 ; H01L33/06 ; H01L33/32 ; H01L33/24 ; H01L33/38

Abstract:
Disclosed are GaN based light emitting devices and methods of manufacturing the same using post-mechanical treatment. The GaN based light emitting device includes first and second electrodes, and a flexible substrate which are sequentially stacked, an n-type GaN layer, an activation layer, and a p-type GaN layer interposed between the first and second electrodes and forming a core-shell structure, and a buried layer interposed between the flexible substrate and the first electrode, wherein the first electrode and the core-shell structure are buried in the buried layer.
Public/Granted literature
- US20160172535A1 GaN BASE LIGHT-EMITTING DIODE AND MANUFACTURING METHOD THEREFOR USING MECHANICAL POST-PROCESSING Public/Granted day:2016-06-16
Information query
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