Invention Grant
- Patent Title: Artificial skin
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Application No.: US14496534Application Date: 2014-09-25
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Publication No.: US09532981B2Publication Date: 2017-01-03
- Inventor: Shunsuke Iriyama , Kenichi Umishio , Makoto Tsunenaga , Shinji Inomata , Eijiro Adachi
- Applicant: Shiseido Company, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shiseido Company, Ltd.
- Current Assignee: Shiseido Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP2010-048159 20100304
- Main IPC: A61F2/10
- IPC: A61F2/10 ; C12N5/071 ; A61L27/60 ; A61K31/4406 ; A61L27/38 ; A61K31/4184 ; A61L27/36
Abstract:
The present invention relates to a method for producing artificial skin, comprising: adding a matrix metalloproteinase inhibitor and a heparanase inhibitor to an artificial skin formation culture medium comprising human epidermal keratinocytes and human dermal fibroblasts, culturing the cells in the artificial skin formation culture medium, and forming artificial skin.
Public/Granted literature
- US09579310B2 Artificial skin Public/Granted day:2017-02-28
Information query
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