Invention Grant
US09533523B2 Reflective features with co-planar elements and processes for making them
有权
具有共面元素和制造它们的工艺的反射特征
- Patent Title: Reflective features with co-planar elements and processes for making them
- Patent Title (中): 具有共面元素和制造它们的工艺的反射特征
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Application No.: US14086653Application Date: 2013-11-21
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Publication No.: US09533523B2Publication Date: 2017-01-03
- Inventor: Richard Einhorn , Mark Hampden-Smith , Miodrag Oljaca , Jainisha Shah
- Applicant: SICPA HOLDING SA
- Applicant Address: CH Prilly
- Assignee: SICPA HOLDING SA
- Current Assignee: SICPA HOLDING SA
- Current Assignee Address: CH Prilly
- Agency: Greenblum & Bernstein, P.L.C.
- Main IPC: B41M3/14
- IPC: B41M3/14 ; B44F1/12 ; B41M5/00 ; B41J2/04
Abstract:
The invention relates to a reflective feature, e.g., reflective security feature or reflective decorative feature, comprising a first element at least partially coplanar with a second element. The first element causes incident light to be reflected with a first intensity that varies as the angle of incidence changes relative to a surface of the reflective feature. The invention also relates to a direct write printing process for forming such a reflective feature from an ink comprising metallic nanoparticles.
Public/Granted literature
- US20150251471A9 REFLECTIVE FEATURES WITH CO-PLANAR ELEMENTS AND PROCESSES FOR MAKING THEM Public/Granted day:2015-09-10
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