Invention Grant
US09533886B2 Vapour deposition process for the preparation of a phosphate compound
有权
用于制备磷酸盐化合物的气相沉积方法
- Patent Title: Vapour deposition process for the preparation of a phosphate compound
- Patent Title (中): 用于制备磷酸盐化合物的气相沉积方法
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Application No.: US14117823Application Date: 2012-07-20
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Publication No.: US09533886B2Publication Date: 2017-01-03
- Inventor: Brian Elliott Hayden , Christopher Edward Lee , Duncan Clifford Alan Smith , Mark Stephen Beal , Xiaojuan Lu , Chihiro Yada
- Applicant: Brian Elliott Hayden , Christopher Edward Lee , Duncan Clifford Alan Smith , Mark Stephen Beal , Xiaojuan Lu , Chihiro Yada
- Applicant Address: GB Chilworth, Southampton JP Aichi
- Assignee: Ilika Technologies Ltd.,Toyota Motor Corporation
- Current Assignee: Ilika Technologies Ltd.,Toyota Motor Corporation
- Current Assignee Address: GB Chilworth, Southampton JP Aichi
- Agency: LeClairRyan, a Professional Corporation
- Priority: GB1112604.2 20110721
- International Application: PCT/GB2012/051740 WO 20120720
- International Announcement: WO2013/011326 WO 20130124
- Main IPC: C23C14/08
- IPC: C23C14/08 ; C01B25/30 ; C23C14/06 ; C23C14/24 ; C30B23/06 ; C30B23/08 ; H01M4/58 ; C01B21/20 ; C01B25/45 ; H01M10/052
Abstract:
The present invention provides a vapour deposition process for the preparation of a phosphate compound, wherein the process comprises providing each component element of the phosphate compound as a vapour, and co-depositing the component element vapours on a common substrate, wherein the component elements react on the substrate to form the phosphate compound.
Public/Granted literature
- US20140287160A1 VAPOUR DEPOSITION PROCESS FOR THE PREPARATION OF A PHOSPHATE COMPOUND Public/Granted day:2014-09-25
Information query
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