Invention Grant
- Patent Title: Method for manufacturing polysilsesquioxane by using carbon dioxide solvent and polysilsesquioxane manufactured using the same
- Patent Title (中): 使用二氧化碳溶剂和聚倍半硅氧烷制造聚倍半硅氧烷的方法
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Application No.: US14350564Application Date: 2013-04-18
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Publication No.: US09534087B2Publication Date: 2017-01-03
- Inventor: In Park , Ha Soo Hwang
- Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Applicant Address: KR Cheonan-Si, Chungcheongnam-Do
- Assignee: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Current Assignee Address: KR Cheonan-Si, Chungcheongnam-Do
- Agency: Revolution IP, PLLC
- Priority: KR10-2012-0145033 20121213
- International Application: PCT/KR2013/003280 WO 20130418
- International Announcement: WO2014/092254 WO 20140619
- Main IPC: C08G77/06
- IPC: C08G77/06 ; C08G77/00 ; C08G77/26 ; C08G77/08 ; C08G77/04 ; C08G77/24 ; C08G77/28
Abstract:
Disclosed is a method for manufacturing the polysilsesquioxane (PSSQ) within the carbon dioxide solvent through the control of the pressure and temperature within a reactor by the state changes, e.g., a liquid state or supercritical state, of carbon dioxide as a solvent which is environmentally friendly and pollution-free, that is to say, by making use of the fact that the solubility of reactant and product is changed according to the pressure and temperature in manufacturing the polysilsesquioxane (PSSQ).
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