Invention Grant
- Patent Title: Combined x-ray and optical metrology
- Patent Title (中): 组合x射线和光学计量学
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Application No.: US14074689Application Date: 2013-11-07
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Publication No.: US09535018B2Publication Date: 2017-01-03
- Inventor: Kevin A. Peterlinz , Andrei V. Shchegrov , Michael S. Bakeman , Thaddeus Gerard Dziura
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Spano Law Group
- Agent Joseph S. Spano
- Main IPC: G01N23/203
- IPC: G01N23/203 ; G01B15/00 ; G01N23/22 ; H01L21/66

Abstract:
Structural parameters of a specimen are determined by fitting models of the response of the specimen to measurements collected by different measurement techniques in a combined analysis. X-ray measurement data of a specimen is analyzed to determine at least one specimen parameter value that is treated as a constant in a combined analysis of both optical measurements and x-ray measurements of the specimen. For example, a particular structural property or a particular material property, such as an elemental composition of the specimen, is determined based on x-ray measurement data. The parameter(s) determined from the x-ray measurement data are treated as constants in a subsequent, combined analysis of both optical measurements and x-ray measurements of the specimen. In a further aspect, the structure of the response models is altered based on the quality of the fit between the models and the corresponding measurement data.
Public/Granted literature
- US20150032398A1 Combined X-Ray and Optical Metrology Public/Granted day:2015-01-29
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