Invention Grant
- Patent Title: Magnetic field probe
- Patent Title (中): 磁场探头
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Application No.: US14498783Application Date: 2014-09-26
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Publication No.: US09535136B2Publication Date: 2017-01-03
- Inventor: Noriko Shimizu , Takashi Ichimura , Takahiro Azuma
- Applicant: MURATA MANUFACTURING CO., LTD.
- Applicant Address: JP Kyoto-Fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto-Fu
- Agency: Studebaker & Brackett PC
- Priority: JP2012-077079 20120329
- Main IPC: G01R33/02
- IPC: G01R33/02 ; G01R33/00 ; G01R29/08

Abstract:
A detector of a magnetic field probe includes a first wiring pattern formed on a first surface of a multilayer substrate and having a predetermined inclination with respect to an axial line direction of the magnetic field probe, a second wiring pattern formed on a second surface and having the predetermined inclination with respect to the axial line direction, and a first penetrating via penetrating through the multilayer substrate in the thickness direction and connecting a front end portion of the first wiring pattern and a front end portion of the second wiring pattern. A rear end portion of the first wiring pattern is connected to a conductor pattern configuring a strip line and a rear end portion of the second wiring pattern is connected to ground patterns configuring the strip line.
Public/Granted literature
- US20150022195A1 MAGNETIC FIELD PROBE Public/Granted day:2015-01-22
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