Invention Grant
- Patent Title: Developing apparatus and developing method
- Patent Title (中): 开发设备和开发方法
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Application No.: US14341920Application Date: 2014-07-28
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Publication No.: US09535328B2Publication Date: 2017-01-03
- Inventor: Tomoyuki Takeishi
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-026208 20140214
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03F7/30 ; G03F7/40 ; H01L21/67
Abstract:
According to one embodiment, a developing apparatus and method comprises moving a first nozzle from a scan start position to a scan end position, with holding a second nozzle for supplying a rinse solution to be adjacent to the scan start position for the first nozzle, while supplying a developing solution from the first nozzle onto a wafer being rotated; and supplying the rinse solution from the second nozzle onto the wafer being rotated.
Public/Granted literature
- US20150234285A1 DEVELOPING APPARATUS AND DEVELOPING METHOD Public/Granted day:2015-08-20
Information query
