Invention Grant
- Patent Title: CMOS compatible resonant interband tunneling cell
- Patent Title (中): CMOS兼容的谐振频带隧道单元
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Application No.: US15045930Application Date: 2016-02-17
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Publication No.: US09536886B2Publication Date: 2017-01-03
- Inventor: Christopher Bowen
- Applicant: Christopher Bowen
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/092 ; H01L29/66

Abstract:
A semiconductor device includes a first diode connected transistor of a first conductivity type and a second diode connected transistor of a second conductivity type connected in series, each of the first and second diode connected transistors being configured to exhibit negative differential resistance in response to an applied voltage. The first drain and first source regions of the first diode connected transistor include dopants of the first conductivity type at degenerate dopant concentration levels and a gate of the first diode connected transistor has a work function that corresponds to that of the semiconductor containing dopants of the second conductivity type. The second drain and second source regions of the second diode connected transistor include dopants of the second conductivity type at degenerate dopant concentration levels and a gate of the second diode connected transistor has a work function that corresponds to that of the semiconductor containing dopants of the first conductivity type.
Public/Granted literature
- US20160260721A1 CMOS COMPATIBLE RESONANT INTERBAND TUNNELING CELL Public/Granted day:2016-09-08
Information query
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