Invention Grant
US09537066B2 Method of manufacturing semiconductor light emitting device, and semiconductor light emitting device 有权
制造半导体发光器件的方法和半导体发光器件

Method of manufacturing semiconductor light emitting device, and semiconductor light emitting device
Abstract:
When an uneven pattern is formed on a light extraction surface composed of a semiconductor crystal by wet-etching using an alkaline solution, a plurality of convex portions cannot be formed in a desired arrangement. A method of manufacturing a semiconductor light emitting device includes a light extraction surface composed of a semiconductor crystal, wherein when the uneven pattern is formed by a plurality of convex portions on the light extraction surface, first, a plurality of impressions are formed on the light extraction surface of a semiconductor layer composed of a semiconductor crystal using a processing substrate, and next, by applying wet-etching to the light extraction surface using an alkaline solution, to thereby form convex portions with a portion where each impression is formed as a top portion, and a plurality of facets of the semiconductor crystal as a side face thereof.
Information query
Patent Agency Ranking
0/0