Invention Grant
US09538587B2 Method and device for closed-loop control of the electrode gap in a vacuum arc furnace
有权
用于真空电弧炉中电极间隙的闭环控制的方法和装置
- Patent Title: Method and device for closed-loop control of the electrode gap in a vacuum arc furnace
- Patent Title (中): 用于真空电弧炉中电极间隙的闭环控制的方法和装置
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Application No.: US13880545Application Date: 2011-10-06
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Publication No.: US09538587B2Publication Date: 2017-01-03
- Inventor: Ralf Oehler , Harald Scholz , Frank-Werner Hoffmann
- Applicant: Ralf Oehler , Harald Scholz , Frank-Werner Hoffmann
- Applicant Address: DE Hanau
- Assignee: ALD VACUUM TECHNOLOGIES GMBH
- Current Assignee: ALD VACUUM TECHNOLOGIES GMBH
- Current Assignee Address: DE Hanau
- Agency: Quarles & Brady LLP
- Priority: DE102010042782 20101021
- International Application: PCT/EP2011/067483 WO 20111006
- International Announcement: WO2012/052302 WO 20120426
- Main IPC: H05B3/60
- IPC: H05B3/60 ; H05B7/148 ; H05B7/152

Abstract:
A method and a device for closed-loop control of an electrode gap in a vacuum arc furnace subjects an electrode gap of a melting electrode from the surface of a melt material to closed-loop control as a function of a droplet short-circuit rate. For this purpose, a histogram of detected droplet short-circuits is created on the basis of at least one droplet short-circuit criterion. The histogram is subdivided into sub-areas, a characteristic sub-area of the histogram is selected for closed-loop control purposes. The electrode gap is subjected to closed-loop control on the basis of the droplet short-circuits which can be associated with the selected sub-area.
Public/Granted literature
- US20130279535A1 Method and Device for Closed-Loop Control of the Electrode Gap in a Vacuum Arc Furnace Public/Granted day:2013-10-24
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