Invention Grant
- Patent Title: High-density rack unit systems and methods
- Patent Title (中): 高密度机架单元系统和方法
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Application No.: US13916164Application Date: 2013-06-12
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Publication No.: US09538687B2Publication Date: 2017-01-03
- Inventor: Daniel L. Miller , Adam R. Hotchkiss
- Applicant: Daniel L. Miller , Adam R. Hotchkiss
- Applicant Address: US TX Dallas
- Assignee: Menara Network, Inc.
- Current Assignee: Menara Network, Inc.
- Current Assignee Address: US TX Dallas
- Agency: Clements Bernard PLLC
- Agent Lawrence A. Baratta, Jr.; Christopher L. Bernard
- Main IPC: H05K7/20
- IPC: H05K7/20 ; H05K7/14

Abstract:
High-density rack unit systems and methods are described for telecommunication and data communication systems that utilize novel airflow mechanisms thereby enabling modularity and high-density in small-form factor units. The high-density rack unit systems and methods offer novel airflow mechanisms via right-angle backplane connectors to enable more airflow in a rack unit as well as novel field replaceable fans in these high-density rack units. Further, the high-density rack unit systems and methods include a baffle structure to keep power-supply-related airflow separate from the airflow over other components in the 1U or 2U rack unit. In this manner, the high-density rack unit systems and methods enable system vendors and network operators to realize significant density improvements.
Public/Granted literature
- US20140369001A1 HIGH-DENSITY RACK UNIT SYSTEMS AND METHODS Public/Granted day:2014-12-18
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