Invention Grant
- Patent Title: Graphite film and process for producing graphite film
- Patent Title (中): 石墨膜和石墨膜生产工艺
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Application No.: US13818400Application Date: 2011-08-19
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Publication No.: US09540285B2Publication Date: 2017-01-10
- Inventor: Yusuke Ohta , Takashi Inada , Makoto Mishiro , Yasushi Nishikawa
- Applicant: Yusuke Ohta , Takashi Inada , Makoto Mishiro , Yasushi Nishikawa
- Applicant Address: JP Osaka
- Assignee: KANEKA CORPORATION
- Current Assignee: KANEKA CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Kagan Binder, PLLC
- Priority: JP2010-188608 20100825
- International Application: PCT/JP2011/068802 WO 20110819
- International Announcement: WO2012/026408 WO 20120301
- Main IPC: C01B31/04
- IPC: C01B31/04 ; C04B35/634 ; C08L77/06 ; C04B35/52 ; C04B35/524 ; C04B35/622

Abstract:
A graphite film which is low in graphite dust generation can be produced by properly selecting acid dianhydride and diamine which constitute a polyimide film, which polyimide film is a raw material of the graphite film. Specifically, the graphite film which is low in graphite dust generation can be obtained if (1) the acid dianhydride is PMDA and the diamine has a molar ratio of ODA/PDA in a range of 100:0 to 80:20, or (2) the acid dianhydride has a molar ratio of PMDA/BPDA in a range of 80:20 to 50:50, and the diamine has a molar ratio of ODA/PDA in a range of 30:70 to 90:10.
Public/Granted literature
- US20130164210A1 GRAPHITE FILM AND PROCESS FOR PRODUCING GRAPHITE FILM Public/Granted day:2013-06-27
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