Invention Grant
US09540339B2 Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
有权
抗蚀剂组合物，形成抗蚀剂图案的方法，用于组合物中的多酚化合物，以及可从其衍生的醇类化合物
- Patent Title: Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
- Patent Title (中): 抗蚀剂组合物，形成抗蚀剂图案的方法，用于组合物中的多酚化合物，以及可从其衍生的醇类化合物
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Application No.: US15005177Application Date: 2016-01-25
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Publication No.: US09540339B2Publication Date: 2017-01-10
- Inventor: Masatoshi Echigo , Masako Yamakawa
- Applicant: Mitsubishi Gas Chemical Company, Inc.
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery LLP
- Priority: JP2011-176923 20110812; JP2011-201757 20110915; JP2011-218626 20110930
- Main IPC: C07D311/78
- IPC: C07D311/78 ; C07C39/225 ; C07D311/96 ; C07C37/20 ; G03F7/031 ; G03F7/038 ; C07C39/14 ; C07C39/17 ; G03F7/004 ; G03F7/20 ; G03F7/32
Abstract:
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
Public/Granted literature
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