Invention Grant
- Patent Title: Gas barrier film and method for manufacturing gas barrier film
- Patent Title (中): 阻气膜及阻气膜的制造方法
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Application No.: US14436252Application Date: 2013-10-15
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Publication No.: US09540526B2Publication Date: 2017-01-10
- Inventor: Shoji Nishio
- Applicant: Konica Minolta, Inc.
- Applicant Address: JP Tokyo
- Assignee: KONICA MINOLTA, INC.
- Current Assignee: KONICA MINOLTA, INC.
- Current Assignee Address: JP Tokyo
- Agency: Cantor Colburn LLP
- Priority: JP2012-231770 20121019
- International Application: PCT/JP2013/077896 WO 20131015
- International Announcement: WO2014/061627 WO 20140424
- Main IPC: C09D7/12
- IPC: C09D7/12 ; C23C16/40 ; C23C16/54 ; H01L51/52 ; C23C14/34 ; C23C16/455 ; C23C16/50
Abstract:
A method for providing a gas barrier film with ample gas barrier properties even in a high temperature, which is maintained when the film is bent. The gas barrier film also has excellent resistance to cracking. A gas barrier film, and a method for manufacturing the same is also disclosed.
Public/Granted literature
- US20150291813A1 GAS BARRIER FILM AND METHOD FOR MANUFACTURING GAS BARRIER FILM Public/Granted day:2015-10-15
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