Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US14840312Application Date: 2015-08-31
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Publication No.: US09543002B2Publication Date: 2017-01-10
- Inventor: Toshiharu Tanaka
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L23/528 ; G11C13/00

Abstract:
The transistor layer is disposed above or below the memory layer and includes a transistor. The wiring line layer connects the memory layer and the transistor layer. The memory cell array comprises a plurality of select gate lines connected to gates of a plurality of the select transistors aligned in a third direction. The wiring line layer comprises: a first connecting wiring line connected to a first select gate line of the plurality of select gate lines and extending in the third direction; and a second connecting wiring line connected to a second select gate line adjacent in a second direction to the first select gate line. This second connecting wiring line at least comprises: a first portion extending in the third direction; and a second portion extending from the first portion to a layer below the first connecting wiring line.
Public/Granted literature
- US20160267972A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2016-09-15
Information query
IPC分类: